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Product&Applications
Semi-insulating SiC substrate
Semi-insulating silicon carbide (SiC) substrates serve as a critical material for the fabrication of high-frequency microwave devices, notably high electron mobility transistors (HEMTs). In comparison to traditional gallium arsenide (GaAs)-based devices, SiC-based RF components demonstrate superior high-frequency signal transmission, minimal signal loss, enhanced power capacity, and exceptional thermal stability. Communication systems incorporating these SiC RF devices exhibit significant advantages in signal fidelity, power efficiency, heat dissipation capability, and environmental adaptability. Consequently, they are extensively deployed in advanced applications including 5G/6G base stations, phased-array radars, satellite communication systems, vehicle-to-everything (V2X) networks, and defense electronic systems
Product Introduction

Our semi-insulating silicon carbide (SiC) substrates achieve exceptional surface shape control precision, characterized by surface roughness Ra < 0.1 nm, Warp ≤ 25 μm, bow ≤ 15 μm, and total thickness variation (TTV) < 5 μm. This high level of precision ensures uniform growth of gallium nitride (GaN) epitaxial layers. With ultra-high resistivity properties (≥ 1×10¹⁰ Ω·cm), these substrates are well-suited for high-frequency and low-loss radio frequency (RF) device applications. Furthermore, their low crystal defect density guarantees long-term reliability in demanding environments such as 5G communication infrastructure and satellite radar systems.